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Rapid Thermal Processing


Rapid thermal processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. Such rapid heating rates are attained by high intensity lamps or laser process. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.

Temperature Control

One of the key challenges in rapid thermal processing is accurate measurement and control of the wafer temperature. Monitoring the ambient with a thermocouple is not feasible, in that the high temperature ramp rates prevent the wafer from coming to thermal equilibrium with the process chamber. One temperature control strategy involves in situ pyrometry to effect real time control.

Manufacturers of RTP Equipment

Applied Materials
Axcelis Technologies
Koyo Thermal Systems
Mattson Technology


Rapid Thermal Processing Tools in our Inventory:

TEL ALPHA-8SE-ZA
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
APPLIED MATERIALS CENTURA TPCC RTP RADIANCE DPN
TEL ALPHA-8SE-Z (ATPf) FTP
KOKUSAI APOGEE 1+
TEL ALPHA 8SE ATPF
TEL ALPHA 8SE
KOKUSAI APOGEE
KOKUSAI APOGEE 1+
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
TEL Alpha 8SE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
KOKUSAI APOGEE
TEL ALPHA-8SE-Z
KOKUSAI APOGEE
TEL Alpha 8SE
KOKUSAI APOGEE
TEL Alpha 8SE?
KOKUSAI APOGEE
APPLIED MATERIALS CENTURA TPCC RADIANCE DPN

Click here to view all Rapid Thermal Processing tools.


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